ECCN

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3C001

3C001 Hetero-epitaxial materials consisting of a “substrate” having stacked epitaxially grown multiple layers of any of the following (see List of Items Controlled).

Category: Category 3—Electronics
Product group: C. “Materials”

Reason for Control

Official text

License Requirements

Reason for Control:

NS, AT

Control(s) Country chart (see Supp. No. 1 to part 738)

NS applies to entire entry NS Column 2.
AT applies to entire entry AT Column 1.

List Based License Exceptions (See Part 740 for a Description of All License Exceptions)

LVS: $3,000

GBS: N/A

List of Items Controlled

Related Controls: (1) This entry does not control equipment or material whose functionality has been unalterably disabled. (2) See also ECCNs 3C907 (Epitaxial materials), 3C908 (Fluorides, hydrides, chlorides, of silicon or germanium), and 3C909 (Silicon, silicon oxides, germanium or germanium oxides).

Related Definitions: N/A

Items:

a. Silicon (Si);

b. Germanium (Ge);

c. Silicon Carbide (SiC); or

d. “III/V compounds” of gallium or indium.

Note:

3C001.d does not apply to a “substrate” having one or more P-type epitaxial layers of GaN, InGaN, AlGaN, InAlN, InAlGaN, GaP, GaAs, AlGaAs, InP, InGaP, AlInP or InGaAlP, independent of the sequence of the elements, except if the P-type epitaxial layer is between N-type layers.

e. Gallium Oxide (Ga2O3); or

f. Diamond.

N.B.:

For materials having layers of isotopically enriched Silicon or Germanium isotopes, see 3C907.

ecfr-15cfr774-supp1-2026-08-28 · effective 2026-08-28

Issue date 2026-08-28. Amendment date 2026-08-28.

eCFR Commerce Control List (15 CFR 774, Supplement No. 1)www.ecfr.gov
eCFR versioner XML captured at ingestwww.ecfr.gov

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