ECCN
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3C002
3C002 Resist materials as follows (see List of Items Controlled) and “substrates” coated with the following resists.
- Category
- Category 3—Electronics
- Product group
- C. “Materials”
Reason for Control
- NS
- AT
Official text
License Requirements
Reason for Control:
NS, AT
Control(s) Country chart(see Supp. No. 1to part 738)
- NS applies to entire entry NS Column 2
- AT applies to entire entry AT Column 1
List Based License Exceptions (See Part 740 for a Description of All License Exceptions)
LVS: $3,000
GBS: Yes for 3C002.a provided that they are not also controlled by 3C002.b through .e.
List of Items Controlled
Related Controls: N/A
Related Definitions: N/A
Items: a. Resists designed for semiconductor lithography as follows:
a.1. Positive resists adjusted (optimized) for use at wavelengths less than 193 nm but equal to or greater than 15 nm;
a.2. Resists adjusted (optimized) for use at wavelengths less than 15 nm but greater than 1 nm;
b. All resists designed for use with electron beams or ion beams, with a sensitivity of 0.01 µcoulomb/mm 2 or better;
c. [Reserved]
d. All resists optimized for surface imaging technologies;
e. All resists designed or optimized for use with imprint lithography equipment specified by 3B001.f.2 that use either a thermal or photo-curable process.
ecfr-15cfr774-supp1-2026-08-28 · effective 2026-08-28
Issue date 2026-08-28. Amendment date 2026-08-28.
- eCFR Commerce Control List (15 CFR 774, Supplement No. 1)www.ecfr.gov
- eCFR versioner XML captured at ingestwww.ecfr.gov
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