ECCN
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3D003
3D003 'Computational lithography' “software” “specially designed” for the “development” of patterns on “EUV”-lithography masks or reticles.
- Category
- Category 3—Electronics
- Product group
- D. “Software”
Reason for Control
- NS
- AT
Official text
License Requirements
Reason for Control:
NS, AT
Control(s) Country chart (see Supp. No. 1 to part 738)
- NS applies to entire entry NS Column 1.
- AT applies to entire entry AT Column 1.
List Based License Exceptions (See Part 740 for a Description of All License Exceptions)
TSR: Yes
List of Items Controlled
Related Controls: N/A
Related Definitions: For the purposes of 3D003, 'computational lithography' is the use of computer modelling to predict, correct, optimize and verify imaging performance of the lithography process over a range of patterns, processes, and system conditions.
Items:
The list of items controlled is contained in the ECCN heading.
ecfr-15cfr774-supp1-2026-08-28 · effective 2026-08-28
Issue date 2026-08-28. Amendment date 2026-08-28.
- eCFR Commerce Control List (15 CFR 774, Supplement No. 1)www.ecfr.gov
- eCFR versioner XML captured at ingestwww.ecfr.gov
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