ECCN
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3E992
3E992 “Technology” for the “production” or “development” of commodities specified in 3B001.a.4, c, d, f.1, f.5, f.6, k to n, p.2, p.4, r; and 3B002.c; and “technology” as follows (see List of Items Controlled).
- Category
- Category 3—Electronics
- Product group
- E. “Technology”
Reason for Control
- NS
- RS
- AT
Official text
License Requirements
Reason for Control:
NS, RS, AT
Control(s) Country Chart (see Supp. No. 1 to part 738)
- NS applies to the entire entry To or within Macau or a destination specified in Country Group D:5 of supplement no. 1 to part 740 of the EAR. See § 742.4(a)(4) of the EAR.
- RS applies to the entire entry To or within Macau or a destination specified in Country Group D:5 of supplement no. 1 to part 740 of the EAR. See § 742.6(a)(6)(i) of the EAR.
- NS applies to “software” for equipment controlled by 3B001.c.1.a or c.1.c Worldwide control. See § 742.4(a)(5) and (b)(10) of the EAR.
- RS applies to “software” for equipment controlled by 3B001.c.1.a or c.1.c Worldwide control. See § 742.6(a)(10) and (b)(11) of the EAR.
- AT applies to entire entry AT Column 1.
List Based License Exceptions (See Part 740 for a Description of All License Exceptions)
TSR: N/A
IEC: Yes, for “technology” for equipment controlled by 3B001.c.1.a, and 3B001.c.1.c, see § 740.2(a)(22) and § 740.24 of the EAR.
Special Conditions for STA
STA: License Exception STA may not be used to ship or transmit “technology” specified in this ECCN to any of the destinations listed in Country Group A:5 or A:6 (see supplement no. 1 to part 740 of the EAR).
List of Items Controlled
Related Controls: N/A
Related Definitions: N/A
Items:
a. “Technology” “specially designed” for the “development” or “production” of commodities specified in 3B001.a.4, c, d, f.1, f.5, f.6, k to n, p.2, p.4, r; or 3B002.c.
b. “Technology” not specified by 3E992.a designed or modified to perform all of the following in or with deep-ultraviolet immersion photolithography equipment:
b.1. Decrease the minimum resolvable feature specified by 3B001.f.1.b; and
b.2. Decrease the maximum 'dedicated chuck overlay' of deep-ultraviolet immersion lithography equipment below or equal to 1.5 nm.
ecfr-15cfr774-supp1-2026-08-28 · effective 2026-08-28
Issue date 2026-08-28. Amendment date 2026-08-28.
- eCFR Commerce Control List (15 CFR 774, Supplement No. 1)www.ecfr.gov
- eCFR versioner XML captured at ingestwww.ecfr.gov
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